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Samsung to Deploy ASML High‑NA EUV in DRAM by 2028, Joins 12‑Inch Photomask Initiative

Samsung says it will work with ASML to adopt High‑NA EUV for high‑volume DRAM by 2028 and join an industry effort on 12‑inch photomasks.

$ASML, #samsung, #asml, #high-na, #euv, #photomasks